ROB takes part to the preparation to the future Solar instrument and missions with the development of new solar blind detectors. Recently, we triggered an action to fabricate wide band gap photodetectors based on AlN and cBN materials with “l’Institut d’Electronique et de Microélectronique et de Nanotechnologie” (IEMN, France) and with Prof W. Zhang from City University of Hong Kong. We designed new lithography masks and defined a complete new technological process with our partners. The geometrical arrangement of the contact electrode was optimized to avoid the sharp dip in sensitivity (30-50% deviation) observed at the centre of the LYRA detectors. The metal fingers have been processed to 2 µm in width with 5µm spacing between the contacts (instead of 15 µm for previous design). We achieved good homogeneity and reproducible lithography patterns.
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